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International Journal of Chemical and Biological Sciences
Peer Reviewed Journal

Vol. 7, Issue 2, Part B (2025)

Designed new modified poly (methyl methacrylate) structures to improve photo resistance

Author(s):

Ahmed Khalid Hussein

Abstract:

Synthesized and engineered novel modified poly (methyl methacrylate) to create diverse polymer derivatives aimed at improving its photo-stability. Aromatic Schiff base moieties were added to commercially available poly (methyl methacrylate) through a synthetic modification. To increase the possibility of preventing cross-linking by bifacial reactions, ethylene diamine was first added in excess to one side of the PMMA polymer. In the second stage, new Schiff base molecules were created by reacting 5-nitro salicylaldehyde with an amino group. The structures of the generated modified polymers were validated using a variety of techniques, such as FTIR and 1H NMR.These methods confirmed the materials' structures and modification percentages. Photo-stabilizers from synthetic chemicals reduce PMMA polymeric chain photodegradation. Photo-stabilizers from synthetic chemicals reduce PMMA polymeric chain photodegradation. Modified PMMA was tested as photo stabilizers using weight loss to observe functional group development during radiation exposure. Authorized tests showed that new modified Schiff base polymers outperform PMMA blank photo-stabilizers. Thus, after 300 hours of UV light exposure, modified PMMA films photodegrade less than unmodified PMMA. Because of their high conjugation mechanism, linked units may absorb UV light.

Pages: 141-146  |  136 Views  72 Downloads


International Journal of Chemical and Biological Sciences
How to cite this article:
Ahmed Khalid Hussein. Designed new modified poly (methyl methacrylate) structures to improve photo resistance. Int. J. Chem. Biol. Sci. 2025;7(2):141-146. DOI: 10.33545/26646765.2025.v7.i2b.164
International Journal of Chemical and Biological Sciences

International Journal of Chemical and Biological Sciences